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Surface Science

Technical Basics

The following tools are currently being used:

Thin Film Growth and Treatment Facilities

Molecular Beam Epitaxy (MBE)

Metallization Chamber

Molecular Organic Chemical Vapour Deposition (MO-CVD)

Rapid Thermal Annealing (RTA)

Spectroscopy

Micro-Raman Spectroscopy

 

Sputter-XPS

 

 

Photoluminescence Laboratory

Time-of-flight Secondary Mass Ion Spectroscopy

XPS & ARUPS

 

 

THz Spectroscopy

Scanning Nanoprobe Auger Electron Spectroscopy

Dynamic Secondary Ion Spectrometer

  

FTIR Spectroscopy

Diffraction

Low Energy Electron Diffraction (LEED)

SmartLab Micro HR

Reflection High Energy Electron Diffraction (RHEED)

High Resolution X-ray Diffraction (HR-XRD)

Microscopy

Surface-Science-Cluster (STM/AFM, PES and LEED)

Dual Focussed Ion Beam – Scanning Electron Microscope (Dual FIB SEM)

Scanning Electron Microscope (SEM)

Air operated Atomic Force Microscopy (AFM)

Transmission Electron Microscopy (TEM)

Electrical Characterization

Capacitance versus voltage (C-V)

Hall–Device

Current versus voltage (J-V)

 

Charge Carrier Life Time Facility

Variable temperature J-V & dielectric relaxation & oxygen partial pressure studies

 

Further methods are available upon request.

The building and the infrastructure of the IHP were funded by the European Regional Development Fund of the European Union, funds of the Federal Government and also funds of the Federal State of Brandenburg.